MOVPE Growth of Nitride Materials for Power Electronics We are seeking a talented and creative postdoctoral researcher to work in the Cambridge Centre for Gallium Nitride, performing growth of nitride materials and devices for applications in power electronics and characterising the resulting materials. The Cambridge Centre for Gallium Nitride is part of the Department of Materials Science and Metallurgy at the University of Cambridge and also leads the nitride activity within the EPSRC National Epitaxy Facility. This post is available under the Ultr AlGaN Programme Grant (EPSRC) in collaboration with the University of Bristol and other partners. The broad objective of the Programme is the development of high-performance AlGaN solid-state circuit breakers (SSCBs). In this context, the successful candidate will contribute to research on the growth of aluminium and nitrogen-polar AlGaN, the growth of graded AlGaN layers, the regrowth of AlGaN, growth on bulk AlN substrates, and the realisation of doping in AlGaN, in particular polarisation doping. The project team also includes the capability for growth by molecular beam epitaxy (MBE), and the successful candidate will exhibit enthusiasm for collaboration across the two growth technologies to achieve optimised materials. The role may also present the opportunity for basic device fabrication to facilitate epitaxy characterisation, and hence experience of device fabrication is desirable. Responsibilities: Manage research activities, generate high-quality data, and develop scientific techniques. Contribute intellectually to the direction of the nitride research within the Centre. Present data locally at lab meetings and seminars, and more widely at international scientific conferences. Draft scientific manuscripts with support from Prof Oliver and contribute to the day-to-day supervision of Masters or PhD students. Requirements: Hold a Ph.D. in Materials Science, Physics, Electrical Engineering, or a related area, or be nearing completion of one. Extensive experience in crystal growth, preferably using metal-organic vapour phase epitaxy (MOVPE). A track record of research on nitride semiconductors or closely related materials. Well-versed in a range of techniques for the characterisation of the structure and properties of materials, with experience in two or more of the following techniques: scanning probe microscopy, x-ray diffraction, scanning electron microscopy, cathodoluminescence spectroscopy, photoluminescence spectroscopy, transmission electron microscopy, Hall probe measurements, or C-V measurements. Candidates with in-depth expertise in scanning probe microscopy are particularly encouraged to apply. Skills in data presentation, both verbally and in writing. Committed to collaborative and interdisciplinary research and able to work both independently and as part of a team. Applications are particularly welcome from women, black, and minority ethnic candidates. The salary range if appointed as a Research Associate is Grade 7 £38,448 - £46,970 per annum (SP041-048), Successful candidates who have not yet received their PhD will be employed on University Grade 5 SP038 (£35,302 per annum) as Research Assistants. Upon being awarded their PhD, their salary will be upgraded to Grade 7 041 as Research Associates. Fixed-term: The funds for the post are available for 24 months in the first instance. To apply online for this vacancy and to view further information about the role, please click the 'Apply' button above. We encourage early applications, as the vacancy may close before the advertised deadline if a sufficient number of suitable applications are received. Documents in support of applications should include a CV and a research statement. The University actively supports equality, diversity and inclusion and encourages applications from all sections of society.
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